The annealing furnace is an essential tool in semiconductor fabrication, used to heat semiconductor wafers to modify their electrical properties. This heat treatment process serves several purposes, including activating dopants, densifying deposited films, and altering the state of grown films, thereby optimizing the wafer’s performance for various applications.
Features:
Chamber
- Quartz tube temperature control by using heating coil and water cooled stainless steel flanges.
- Furnace configuration: Horizontal with loading mechanism.
- Manual furnace door with viewport.
Options
- Sputter.
- PECVD.
- Dry Etching.
- ALD/PEALD.
- Plasma Cleaning.
- Annealing.
- E-beam evaporator.
- Thermal Evaporator .
Applications:
- Semiconductor.
- MEMS.
- Nanotechnoloy.
- LED.
- Photovoltaic industries.
- FPD.