The Syskey Magnetron Sputter is a type of thin-film deposition system that uses magnetron sputtering technology. This method is widely used for producing thin films or coatings on various substrates, such as glass, metals, ceramics, and polymers, by utilizing plasma to eject atoms from a target material. The sputtered atoms then deposit onto the surface of the substrate, forming a thin, uniform film.
List if magnetron sputters:
- Co-Sputter
- UHV Sputter
- Multi-Layer Sputter
- In-Line Sputter
- FPD-PVD
Features:
- Magnetron Sputtering Technology: Utilizes magnetic fields to enhance the sputtering process, leading to more efficient deposition.
- High-Quality Thin Films: Capable of producing high-quality films with precise control over thickness, uniformity, and material composition.
- Versatile Application: Can be used for a wide range of materials and coatings, including metals, oxides, and nitrides.
- Multi-Layer Deposition: Allows for the deposition of multi-layer coatings, essential for creating advanced materials with specific properties.
- Customizable: Systems can be tailored to meet specific research or industrial needs.
Applications:
- Semiconductors​.
- Nanotechnology.
- Product QC & QA.
- Oxide, Nitride and Metal.
- Materials research.
- Solar-cell.
- Optical Research.
- Materials Research.