53-1, Jalan Equine 9, Taman Equine, Bandar Putra Permai, 43300 Seri Kembangan, Selangor, Malaysia.
+603 8941 5634

Mask aligner and exposure-masking system: the UV-KUB range

The UV KUB range is a set of equipment designed for soft lithography, consisting of three UV exposure-masking systems for photolithography and one UV curing adhesive system. All systems in the range utilize UV-LED light sources for precise and efficient performance.

 

Models:

  • UV-KUB 2 – UV-LED masking system
  • UV-KUB 3 – New generation of Mask aligner
  • UV-KUB 9 – Insolator high-power density
  • K-ILU 2 – UV-LED curing adhesive system

 

Features:

  • UV-LED Light Source: Ensures high efficiency and precision in exposure, with minimal thermal impact on substrates.
  • Mask Aligner: Provides accurate alignment of masks and substrates for high-quality pattern transfer.
  • Exposure-Masking Systems: Enables precise exposure for photolithography applications, ideal for soft lithography processes.
  • Compact Design: Space-efficient systems suitable for both research and small-scale production environments.
  • Customizable: Offers flexibility to meet various lithographic requirements, including different substrate sizes and exposure settings.

 

Applications:

  • Microfluidics
  • Microelectronics
  • Photonics
  • Surface functionalization
  • Micromechanics